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PRODUCT INFORMATION | TRACE-RITE® CLASSIC
RF-Based End Point System
Fast and accurate RF endpoint signals.

TRACE-RITE® provides real time RF-based endpoint detection for either plasma etch or deposition chamber clean. It is designed to deploy and operate autonomously within the manufacturing environment by communicating directly with the process tool to detect and signal endpoint. TRACE-RITE® provides an array of communication protocols to readily integrate with tools used in the semiconductor, FPD and solar manufacturing industries.

TRACE-RITE® leverages the SENSE-RITE® measurement platform, operating at the point-of-use of delivered power over the wide range of process powers commonly used by plasma-based process tools.
TRACE-RITE® runs "unattended" but is web-enabled for configuration, monitoring and data file transfer over a LAN or directly from a PC. A permanent LAN or PC connection is not required for endpoint operation.
 
Download the TRACE-RITE® Sales Sheet PDF
TRACE-RITE

The Forth-Rite optimization process reduces PFC gas usage up to 50% without extending the overall cleaning time.

The World Semiconductor Council has agreed to reduce PFC emissions by >10% by 2010. Because PECVD and CVD chamber cleans represent 60-90% of a fab's total PFC emissions, to attain this goal a typical 200mm fab would need to reduce chamber clean emissions by 95%. Trace-Rite enables this more environmentally conscious operation along with significant cost savings through:

  • Clean time reduction
  • Gas usage optimization
Trace-Rite end point detection typically:
  • Saves 10 to 50% of conventional clean times
  • Enables overall C2F6 usage to be reduced up to 50%.



The RF signals used by TRACE-RITE® display strong signal transitions. These changes reflect changes in the state of the process chamber. Multiple algorithm and scaling options makes endpoint detection repeatable and reliable.


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