The Ultimate RF Measurement and Control Technology for Semiconductor, Flat Panel and Photovoltaic Manufacturing
The FORTH-RITE® line of advanced analysis and control products focus state-of-the-art RF and impedance measurement technologies onto application specific solutions in the field of plasma-based manufacturing including network analysis, endpoint detection and closed-loop delivered power control.
The foundation for all FORTH-RITE® solutions is the SENSE-RITE® measurement technology. With multiple patents issued and pending, SENSE-RITE® defines the state-of-the-art in RF voltage, current, phase and power measurement. By installing SENSE-RITE® at the RF power point-of-use, FORTH-RITE® has created integrated systems which address problems common to both plasma etch and deposition. Two versions of SENSE-RITE® are available - 5kW and 30kW.
TRACE-RITE® is designed to provide real time RF measurement-based endpoint signals for either plasma etch or plasma chamber clean. Transitions in direct SENSE-RITE measurements and calculated impedance values are used to detect endpoint. TRACE-RITE® mini and TRACE-RITE® analog support analog signal inputs and allow the process tool to call endpoint with the existing program. TRACE-RITE® RPS is developed for remote plasma chamber clean applications.
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FORTH-RITE® founders have decades of expertise and have been involved in every major design of RF and impedance-based measuring technology available today. When it comes to experience and quality solutions, choose only the best - choose FORTH-RITE®.